development of photoresist

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• development of photorezist — fotorezisto ryškinimas statusas T sritis radioelektronika atitikmenys: angl. development of photorezist vok. Photoresistentwicklung, f rus. проявление фоторезиста, n pranc. développement du photorésist, m …   Radioelektronikos terminų žodynas

• développement du photorésist — fotorezisto ryškinimas statusas T sritis radioelektronika atitikmenys: angl. development of photorezist vok. Photoresistentwicklung, f rus. проявление фоторезиста, n pranc. développement du photorésist, m …   Radioelektronikos terminų žodynas

• Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of …   Wikipedia

• Photolithography — For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of …   Wikipedia

• materials science — the study of the characteristics and uses of various materials, as glass, plastics, and metals. [1960 65] * * * Study of the properties of solid materials and how those properties are determined by the material s composition and structure, both… …   Universalium

• Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… …   Wikipedia

• Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… …   Wikipedia

• Double patterning — is a class of technologies developed for photolithography to enhance the feature density. For the semiconductor industry, double patterning is the only lithography technique to be used for the 32 nm and 22 nm half pitch nodes in 2008 2009 and… …   Wikipedia

• Nerve guidance conduit — A nerve guidance conduit (also referred to as an artificial nerve conduit or artificial nerve graft, as opposed to an autograft) is an artificial means of guiding axonal regrowth to facilitate nerve regeneration and is one of several clinical… …   Wikipedia

• Contact lithography — Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. Contents 1… …   Wikipedia

• Ultraviolet — UV redirects here. For other uses, see UV (disambiguation). UVB redirects here. For the mysterious shortwave radio station in Russia, see UVB 76. For other uses, see Ultraviolet (disambiguation). False color image of the Sun s corona as seen in… …   Wikipedia